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Título de Acceso Abierto

Science and Technology of Advanced Materials

Resumen/Descripción – provisto por la editorial en inglés
Science and Technology of Advanced Materials is the leading open access, international journal covering a broad spectrum of materials science research including functional materials, synthesis and processing, theoretical analyses, characterization and properties of materials. Emphasis is placed on the interdisciplinary nature of materials science and issues at the forefront of the field, such as energy and environmental issues, as well as medical and bioengineering applications.
Palabras clave – provistas por la editorial

materials science; biomedical and bio-inspired materials; energy; environment; nanoscale materials

Disponibilidad
Institución detectada Período Navegá Descargá Solicitá
No requiere desde mar. 2000 / hasta nov. 2007 Directory of Open Access Journals acceso abierto
No requiere desde mar. 2000 / hasta nov. 2007 IOPScience acceso abierto
No requiere desde mar. 2000 / hasta nov. 2007 ScienceDirect acceso abierto
No requiere desde ene. 2000 / hasta nov. 2007 Taylor and Francis Online acceso abierto

Información

Tipo de recurso:

revistas

ISSN impreso

1468-6996

ISSN electrónico

1878-5514

Idiomas de la publicación

  • inglés

País de edición

Reino Unido

Fecha de publicación

Información sobre licencias CC

https://creativecommons.org/licenses/by/4.0/

https://creativecommons.org/licenses/by-nc/4.0/

Cobertura temática

materiales

Ingeniería de los materiales

Tabla de contenidos

doi: 10.1016/s1468-6996(01)00135-8

Formation of a-C thin films by plasma-based ion implantation

Toshiya Watanabe; Kazuhiro Yamamoto; Yoshinori Koga; Akihiro Tanaka

Palabras clave: General Materials Science.

Pp. 539-545

doi: 10.1016/s1468-6996(01)00136-x

A series of modeling of plasma etching and damage reduction: vertically integrated computer aided design for device processing

Toshiaki Makabe; Jun Matsui; Kazunobu Maeshige

Palabras clave: General Materials Science.

Pp. 547-554

doi: 10.1016/s1468-6996(01)00137-1

Studies of CF2 radical and O atom in oxygen/fluorocarbon plasmas by laser-induced fluorescence

S. Hayashi; K. Kawashima; N. Ozawa; H. Tsuboi; T. Tatsumi; M. Sekine

Palabras clave: General Materials Science.

Pp. 555-561

doi: 10.1016/s1468-6996(01)00138-3

Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching

Tumura Masashi; Shinzo Yoshikado

Palabras clave: General Materials Science.

Pp. 563-569

doi: 10.1016/s1468-6996(01)00139-5

Recent development of plasma pollution control technology: a critical review

Jen-Shih Chang

Palabras clave: General Materials Science.

Pp. 571-576

doi: 10.1016/s1468-6996(01)00140-1

Emission spectrometry for discharge plasma diagnosis

Kazuo Shimizu; Tetsuji Oda

Palabras clave: General Materials Science.

Pp. 577-585

doi: 10.1016/s1468-6996(01)00141-3

Experimental study of atmospheric pressure surface discharge in helium

Miloslav Štefečka; Darlusz Korzec; Milan Širý; Yoji Imahori; Masashi Kando

Palabras clave: General Materials Science.

Pp. 587-593

doi: 10.1016/s1468-6996(01)00142-5

Determination of metastable atom concentration by use of electrostatic probe technique

Dariusz Korzec; Mamunur Rashid Talukder; Kando Kando

Palabras clave: General Materials Science.

Pp. 595-605

doi: 10.1016/s1468-6996(01)00121-8

Index Title

Palabras clave: General Materials Science.

Pp. i-ii

doi: 10.1016/s1468-6996(01)00122-x

Contents Index

Palabras clave: General Materials Science.

Pp. iii-iv