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Título de Acceso Abierto

Science and Technology of Advanced Materials

Resumen/Descripción – provisto por la editorial en inglés
Science and Technology of Advanced Materials is the leading open access, international journal covering a broad spectrum of materials science research including functional materials, synthesis and processing, theoretical analyses, characterization and properties of materials. Emphasis is placed on the interdisciplinary nature of materials science and issues at the forefront of the field, such as energy and environmental issues, as well as medical and bioengineering applications.
Palabras clave – provistas por la editorial

materials science; biomedical and bio-inspired materials; energy; environment; nanoscale materials

Disponibilidad
Institución detectada Período Navegá Descargá Solicitá
No requiere desde mar. 2000 / hasta nov. 2007 Directory of Open Access Journals acceso abierto
No requiere desde mar. 2000 / hasta nov. 2007 IOPScience acceso abierto
No requiere desde mar. 2000 / hasta nov. 2007 ScienceDirect acceso abierto
No requiere desde ene. 2000 / hasta nov. 2007 Taylor and Francis Online acceso abierto

Información

Tipo de recurso:

revistas

ISSN impreso

1468-6996

ISSN electrónico

1878-5514

Idiomas de la publicación

  • inglés

País de edición

Reino Unido

Fecha de publicación

Información sobre licencias CC

https://creativecommons.org/licenses/by/4.0/

https://creativecommons.org/licenses/by-nc/4.0/

Tabla de contenidos

Preface

Kouichi Ono

Palabras clave: General Materials Science.

Pp. 459-459

Cosmic plasmas: their research frontiers

T. Terasawa

Palabras clave: General Materials Science.

Pp. 461-472

Fast magnetic reconnection with anomalous ion heating and its application

Y. Ono; M. Inomoto; Y. Ueda; T. Matsuyama

Palabras clave: General Materials Science.

Pp. 473-482

Characteristics of the plasma sheath and the charging near the ion engine of the spacecraft

Y.N. Nejoh

Palabras clave: General Materials Science.

Pp. 483-488

The effect of the trapping of dust grains on the sheath structure and the charging in a plasma

Y.N. Nejoh; T. Ishida

Palabras clave: General Materials Science.

Pp. 489-493

Chemical-reaction dependence of plasma parameter in reactive silane plasma

Madoka Takai; Tomonori Nishimoto; Michio Kondo; Akihisa Matsuda

Palabras clave: General Materials Science.

Pp. 495-503

H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration

Masaharu Shiratani; Hong Jie Jin; Kosuke Takenaka; Kazunori Koga; Toshio Kinoshita; Yukio Watanabe

Palabras clave: General Materials Science.

Pp. 505-515

Laser-ablated plasma for deposition of ZnO thin films on various substrates

T. Ohshima; R.K. Thareja; Y. Yamagata; T. Ikegami; K. Ebihara; J. Narayan

Palabras clave: General Materials Science.

Pp. 517-523

Colossal magnetoresistive and ferroelectric thin films deposited by excimer laser induced plasma

F. Mitsugi; T Ikegami; K. Ebihara; J. Narayan; A.M. Grishin

Palabras clave: General Materials Science.

Pp. 525-531

Preparation of the hard CNx thin films using NO ambient gas by pulsed laser deposition

Shin-ichi Aoqui; Tamiko Ohshima; Tomoaki Ikegami; Kenji Ebihara

Palabras clave: General Materials Science.

Pp. 533-537