Catálogo de publicaciones - revistas
Título de Acceso Abierto
Science and Technology of Advanced Materials
Resumen/Descripción – provisto por la editorial en inglés
Science and Technology of Advanced Materials is the leading open access, international journal covering a broad spectrum of materials science research including functional materials, synthesis and processing, theoretical analyses, characterization and properties of materials. Emphasis is placed on the interdisciplinary nature of materials science and issues at the forefront of the field, such as energy and environmental issues, as well as medical and bioengineering applications.Palabras clave – provistas por la editorial
materials science; biomedical and bio-inspired materials; energy; environment; nanoscale materials
Disponibilidad
Institución detectada | Período | Navegá | Descargá | Solicitá |
---|---|---|---|---|
No requiere | desde mar. 2000 / hasta nov. 2007 | Directory of Open Access Journals | ||
No requiere | desde mar. 2000 / hasta nov. 2007 | IOPScience | ||
No requiere | desde mar. 2000 / hasta nov. 2007 | ScienceDirect | ||
No requiere | desde ene. 2000 / hasta nov. 2007 | Taylor and Francis Online |
Información
Tipo de recurso:
revistas
ISSN impreso
1468-6996
ISSN electrónico
1878-5514
Idiomas de la publicación
- inglés
País de edición
Reino Unido
Fecha de publicación
2000-
Información sobre licencias CC
https://creativecommons.org/licenses/by/4.0/
Cobertura temática
Tabla de contenidos
Preface
Kouichi Ono
Palabras clave: General Materials Science.
Pp. 459-459
Cosmic plasmas: their research frontiers
T. Terasawa
Palabras clave: General Materials Science.
Pp. 461-472
Fast magnetic reconnection with anomalous ion heating and its application
Y. Ono; M. Inomoto; Y. Ueda; T. Matsuyama
Palabras clave: General Materials Science.
Pp. 473-482
Characteristics of the plasma sheath and the charging near the ion engine of the spacecraft
Y.N. Nejoh
Palabras clave: General Materials Science.
Pp. 483-488
The effect of the trapping of dust grains on the sheath structure and the charging in a plasma
Y.N. Nejoh; T. Ishida
Palabras clave: General Materials Science.
Pp. 489-493
Chemical-reaction dependence of plasma parameter in reactive silane plasma
Madoka Takai; Tomonori Nishimoto; Michio Kondo; Akihisa Matsuda
Palabras clave: General Materials Science.
Pp. 495-503
H-assisted plasma CVD of Cu films for interconnects in ultra-large-scale integration
Masaharu Shiratani; Hong Jie Jin; Kosuke Takenaka; Kazunori Koga; Toshio Kinoshita; Yukio Watanabe
Palabras clave: General Materials Science.
Pp. 505-515
Laser-ablated plasma for deposition of ZnO thin films on various substrates
T. Ohshima; R.K. Thareja; Y. Yamagata; T. Ikegami; K. Ebihara; J. Narayan
Palabras clave: General Materials Science.
Pp. 517-523
Colossal magnetoresistive and ferroelectric thin films deposited by excimer laser induced plasma
F. Mitsugi; T Ikegami; K. Ebihara; J. Narayan; A.M. Grishin
Palabras clave: General Materials Science.
Pp. 525-531
Preparation of the hard CNx thin films using NO ambient gas by pulsed laser deposition
Shin-ichi Aoqui; Tamiko Ohshima; Tomoaki Ikegami; Kenji Ebihara
Palabras clave: General Materials Science.
Pp. 533-537