Catálogo de publicaciones - revistas
Vacuum
Resumen/Descripción – provisto por la editorial en inglés
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting and sintering. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
Palabras clave – provistas por la editorial
No disponibles.
Disponibilidad
Institución detectada | Período | Navegá | Descargá | Solicitá |
---|---|---|---|---|
No detectada | desde ene. 1951 / hasta dic. 2023 | ScienceDirect |
Información
Tipo de recurso:
revistas
ISSN impreso
0042-207X
ISSN electrónico
1879-2715
Editor responsable
Elsevier
País de edición
Reino Unido
Fecha de publicación
1951-
Cobertura temática
Tabla de contenidos
Analytical model for the Fermi energy and the work function of thin metallic films
V.P. Kurbatsky; V.V. Pogosov
Palabras clave: Instrumentation; Surfaces, Coatings and Films; Condensed Matter Physics.
Pp. 185-189
Structural, optical and electrical properties of AZO/Cu/AZO tri-layer films prepared by radio frequency magnetron sputtering and ion-beam sputtering
Tianlin Yang; Zhisheng Zhang; Shumei Song; Yanhui Li; MaoShui Lv; Zhongchen Wu; Shenghao Han
Pp. 257-260
Highly transparent conductive and near-infrared reflective ZnO:Al thin films
Li Gong; Zhizhen Ye; Jianguo Lu; Liping Zhu; Jingyun Huang; Xiuquan Gu; Binghui Zhao
Palabras clave: Instrumentation; Surfaces, Coatings and Films; Condensed Matter Physics.
Pp. 947-952