Catálogo de publicaciones - libros
Título de Acceso Abierto
Nanoimprint Lithography Technology and Applications
Resumen/Descripción – provisto por la editorial
No disponible.
Palabras clave – provistas por la editorial
nanoimprint lithography; polymer; formulation development; surface chemistry; click chemistry; plasmons; Bragg SPPs; angle of incidence; grating; organic solar cell; ultraviolet nanoimprint lithography; durability; anisotropy; contact angle; line and space; high aspect ratio micro-structure; roll-to-plate nanoimprint lithography; superhydrophobic; oleophobic; biomimetic surface; large-area patterning; negligible residual layer; partial cavity filling; guiding chart; defect avoidance; hydrodynamic instabilities; T-NIL; UV-NIL; el-UV-NIL; el-T-NIL; optical planar waveguides; roll-to-plate R2P nanoimprinting; UV-curable polymers; inorganic-organic hybrid polymer; optical losses; SmartNIL; R2R UV-NIL; neuronal cell assay; nanoimprint lithography (NIL); undercut features; master; Blu-Ray patterning; reactive ion etching; biomimetics; morpho butterfly; n/a
Disponibilidad
Institución detectada | Año de publicación | Navegá | Descargá | Solicitá |
---|---|---|---|---|
No requiere | Directory of Open access Books |
Información
Tipo de recurso:
libros
ISBN electrónico
978-3-0365-4481-6
País de edición
Suiza