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Palabras clave – provistas por la editorial

PECVD; plasma diagnostics; nc-Si:H; RF-PECVD; Fourier-transform infrared spectroscopy (FTIR); quadruple mass spectrometry (QMS); optical emission spectroscopy (OES); X-ray diffraction spectroscopy (XRD); micro hollow glass spheres (MHGS); solid micro glass spheres (SMGS); liquid phase deposition (LPD); aluminum coating; β-Ga2O3; MOCVD; VI/III ratio; scandium stabilized zirconia thin films; e-beam physical vapor deposition; thin films ceramics; Raman spectroscopy; X-ray diffraction; initiated chemical vapor deposition (iCVD); superhydrophobic; fluoropolymer; thin film; atomic layer deposition; nanomechanics; Young’s modulus; shear modulus; resonant frequency; Q-factor; microcantilevers; internal stress; nickel–chromium; thin film thermocouples; physical vapor deposition; flat film extrusion; foil quality; MgF2; color center absorption; density; crystal frequency; stress; adhesion; polarization controlling; dual functional-metalens; focusing; splitting; PVD coatings; nanoindentation; brittle cracking; fracture toughness; diamond coatings; residual stresses; interfacial fatigue strength; annealing; milling; n/a