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Palabras clave – provistas por la editorial

block copolymer self-assembly; analytical ultracentrifugation; tannic acid; 3D printing; nano-resolution; arbitrary distribution; multimaterials; deposition surface; rapidity; large scale; conjugated polymers; polyfullerenes; processing by convective self-assembly; thin films and microstructure; photoluminescence quenching; block copolymers; self-assembly; polymer interface; nanostructure metrology; line edge roughness LER; (S)TEM; STEM-EELS of PS and PMMA; directed self-assembly; nanospheres lithography; colloidal nanospheres; direct laser-writing; directed self-assembly (DSA); block copolymers (BCPs); chemo-epitaxy; polystyrene-block-polymethylmethacrylate (PS-b-PMMA); line/space patterning; line edge roughness (LER); line width roughness (LWR); sequential infiltration synthesis; block copolymer; nanoparticles; colloidal clusters; colloidal molecules; sedimentation; separation; classification of nanoparticles; analytical centrifugation; differential centrifugal sedimentation; disk centrifuge; density gradient centrifugation