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Palabras clave – provistas por la editorial

epitaxial graphene; copper; redox reaction; electrodeposition; voltammetry; chronoamperometry; DFT; silicon carbide; Raman spectroscopy; 2D peak line shape; G peak; charge density; strain; atomic layer deposition; high-k insulators; ion implantation; Raman; AFM; XPS; graphene; SiC; 3C-SiC on Si; substrate interaction; carrier concentration; mobility; intercalation; buffer layer; surface functionalization; twistronics; twisted bilayer graphene; flat band; epitaxial graphene on SiC; quasi-free-standing graphene; monolayer graphene; high-temperature sublimation; terahertz optical Hall effect; free charge carrier properties; sublimation; electronic properties; material engineering; deposition