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Título de Acceso Abierto

Science and Technology of Advanced Materials

Resumen/Descripción – provisto por la editorial en inglés
Science and Technology of Advanced Materials is the leading open access, international journal covering a broad spectrum of materials science research including functional materials, synthesis and processing, theoretical analyses, characterization and properties of materials. Emphasis is placed on the interdisciplinary nature of materials science and issues at the forefront of the field, such as energy and environmental issues, as well as medical and bioengineering applications.
Palabras clave – provistas por la editorial

materials science; biomedical and bio-inspired materials; energy; environment; nanoscale materials

Disponibilidad
Institución detectada Período Navegá Descargá Solicitá
No requiere desde mar. 2000 / hasta nov. 2007 Directory of Open Access Journals acceso abierto
No requiere desde mar. 2000 / hasta nov. 2007 IOPScience acceso abierto
No requiere desde mar. 2000 / hasta nov. 2007 ScienceDirect acceso abierto
No requiere desde ene. 2000 / hasta nov. 2007 Taylor and Francis Online acceso abierto

Información

Tipo de recurso:

revistas

ISSN impreso

1468-6996

ISSN electrónico

1878-5514

Idiomas de la publicación

  • inglés

País de edición

Reino Unido

Fecha de publicación

Información sobre licencias CC

https://creativecommons.org/licenses/by/4.0/

https://creativecommons.org/licenses/by-nc/4.0/

Cobertura temática

materiales

Ingeniería de los materiales

Tabla de contenidos

doi: 10.1016/s1468-6996(00)00020-6

Sublattice reversal epitaxy: a novel technique for fabricating domain-inverted compound semiconductor structures

T. Kondo; S. Koh; R. Ito

Palabras clave: General Materials Science.

Pp. 173-179

doi: 10.1016/s1468-6996(00)00015-2

A study of dielectric breakdown mechanism through the statistical analysis of post-breakdown resistance of thin SiO2 films

A. Toriumi; H. Satake

Palabras clave: General Materials Science.

Pp. 181-186

doi: 10.1016/s1468-6996(00)00018-8

Fabrication of oxide-gate thin-film transistors using PECVD/PLD multichamber system

N. Matsuki; J. Ohta; H. Fujioka; M. Oshima; M. Yoshimoto; H. Koinuma

Palabras clave: General Materials Science.

Pp. 187-190

doi: 10.1016/s1468-6996(00)00016-4

Recent development and prospect of electromagnetic processing of materials

S. Asai

Palabras clave: General Materials Science.

Pp. 191-200

doi: 10.1016/s1468-6996(01)00002-x

Hydrogels with the ordered structures

T. Miyazaki; K. Yamaoka; T. Kaneko; J.P. Gong; Y. Osada

Palabras clave: General Materials Science.

Pp. 201-210

doi: 10.1016/s1468-6996(01)00006-7

Characteristics of post-annealed SrTiO3 thin films prepared by mirror-confinement-type ECR plasma sputtering

So Baba; Ken Numata; Shoji Miyake

Palabras clave: General Materials Science.

Pp. 211-217

doi: 10.1016/s1468-6996(01)00004-3

Mechanism of nucleation and growth of cubic boron nitride thin films

D.V. Shtansky; Y. >Yamada-Takamura; T. Yoshida; Y. Ikuhara

Palabras clave: General Materials Science.

Pp. 219-225

doi: 10.1016/s1468-6996(00)00021-8

Covalency, semiconductor-like and thermoelectric properties of Al-based quasicrystals: icosahedral cluster solids

K. Kirihara; K. >Kimura

Palabras clave: General Materials Science.

Pp. 227-236

doi: 10.1016/s1468-6996(01)00003-1

Pt diffusion in B2-type ordered NiAl intermetallic compound and its diffusion mechanisms

Y. Minamino; Y. >Koizumi; N. Tsuji; M. Morioka; K. Hirao; Y. Shirai

Palabras clave: General Materials Science.

Pp. 237-249

doi: 10.1016/s1468-6996(01)00005-5

Cold model experiment on dynamic behavior of dross in hot dip plating bath

J. Kurobe; M. >Iguchi

Palabras clave: General Materials Science.

Pp. 251-259